Image: OpcedPhotomask

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Description: A realistic photomask. It is obtained by taking a polygon layout we desire to have on the wafer, adding to it assist features, and applying en:optical proximity correction.
Title: OpcedPhotomask
Credit: Own work
Author: LithoGuy
Usage Terms: Creative Commons Attribution-Share Alike 3.0
License: CC BY-SA 3.0
License Link: http://creativecommons.org/licenses/by-sa/3.0
Attribution Required?: Yes

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