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Image: Wet etching tanks at LAAS (6 inches) 0468

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Description: etching tanks used to perform Piranha, Hydrofluoric acid or RCA clean on 6-inch wafer batches at LAAS-CNRS technological facility in Toulouse, France.
Title: Wet etching tanks at LAAS (6 inches) 0468
Credit: Own work
Author: Guillaume Paumier (user:guillom)
Permission: Own work, attribution, share-alike: Multi-license with GFDL and Creative Commons CC-BY-SA-3.0
Usage Terms: Creative Commons Attribution-Share Alike 3.0
License: CC BY-SA 3.0
License Link: http://creativecommons.org/licenses/by-sa/3.0
Attribution Required?: Yes

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